Direct observation of removal of SiO₂ nano-particles from silica surfaces: an evanescent field microscopy study and shear flow acting moment

Abstract It has been difficult to detach smaller abrasive nano-particles from polished surfaces. In this article, we observed the behaviors of Ø50, 70, and 300 nm SiO 2 particles on a silica surface in an inevitable liquid nano-scale shear flow field as rinse cleaning by using evanescent light. These results implied that larger-sized were detached because quantitative moment acting particle is considerably higher than those sub-100 particles. The would be able describe detachability surface.